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  • An exemplary thickness t.sub.1 of the substrate is about 28 mil, which can be about 8 to about 32 mil.In the illustrated example, the substrate 12 comprises a semiconductive material such as monocrystalline silicon, polycrystalline silicon, germanium, silicon-on-glass, or silicon-on-sapphire, for example, but can also comprises a non-conductive(electrically insulating) material such as a ceramic,
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