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  • In the figure, 2 is a high resistivity n- layer (which may also be a ?? layer or i layer of an intrinsic semiconductor), 3 is a high impurity density p+ layer of such a shape as not to close the channel, which is a region of stripe- or mesh-patterned structure, and 4 is a length with the same high resistivity n- character as the n- layer 2.
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