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An Entity of Type : prov:Entity, within Data Space : webisa.webdatacommons.org associated with source dataset(s)

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  • The plasma processing system includes a vacuum chamber; a platform which holds the substrate during plasma processing; a sputter source onto which the target is mounted; an RF coil located inside of the chamber and located between the target and the platform; and a coil shield assembly including a first shield located inside the RF coil and a barrier structure located between the first shield and
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