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  • The source or drain regions 938 of the pixel TFT 953 are formed likewise to those of the first and second n-channel TFTs 951, 952. [0112] In the same way as in Embodiment 3, an interlayer insulating film is formed of a first interlayer insulating film 916 which is made of an inorganic material such as silicon oxide, silicon nitride or silicon oxynitride, and a second interlayer insulating film 917
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