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  • The semiconductor layer 40, and the ohmic contact layer 50 may be formed along data lines 62 to be formed later. [0068] As shown in FIGS. 6A and 6B, a conductive layer based on a conductive material such as chrome, molybdenum, molybdenum alloy, aluminum, aluminum alloy, silver and silver alloy is deposited onto the substrate 10, and patterned through photolithography to thereby form a data line as
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