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An Entity of Type : prov:Entity, within Data Space : webisa.webdatacommons.org associated with source dataset(s)

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  • According to an example embodiment in which a negative photoresist material is provided substantially overlying thin film layer 230, the photoresist material is patterned by exposing the photoresist material to radiation such as ultraviolet light to form exposed portion 272 and unexposed portions 273.
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