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  • amide precursors and method of using sameUS20030188682Aug 27, 2002Oct 9, 2003Asm Microchemistry OyMethod of growing oxide filmsUS20040096582Nov 14, 2002May 20, 2004Ziyun WangComposition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitrideUS20040197946Apr 21, 2004Oct 7, 2004Micron Technology, Inc.Sy
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