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An Entity of Type : prov:Entity, within Data Space : webisa.webdatacommons.org associated with source dataset(s)

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  • A base insulating film 32 made from a film such as silicon nitride, silicon oxynitride, or silicon oxide is formed with a thickness of 10 to 200 nm (preferably from 10 to 100 nm) on the substrate 31 by a known method (LPCVD, plasma CVD, and the like).
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