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  • dDeposition method for forming a film including metal, nitrogen and carbonUS7494908May 15, 2007Feb 24, 2009Applied Materials, Inc.Apparatus for integration of barrier layer and seed layerUS7501343Apr 24, 2007Mar 10, 2009Applied Materials, Inc.Formation of boride barrier layers using chemisorption techniquesUS7501344Apr 24, 2007Mar 10, 2009Applied Materials, Inc.Formation of boride barrier layers u
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