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  • Preferably, the etchant does not include an oxidant, such as oxygen, since the purpose of this step is to remove the mask layer 18 (except those mask layers 18 a, 18 b, 18 c and 18 d which are respectively protected by resist members 20 a, 20 b, 20 c and 20 d) and not to remove the patterned resist 20.
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