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  • minatesUS7491430Jul 14, 2005Feb 17, 2009Tokyo Electron LimitedDeposition method for forming a film including metal, nitrogen and carbonUS7491634Apr 28, 2006Feb 17, 2009Asm International N.V.Methods for forming roughened surfaces and applications thereofUS7494873Jul 25, 2006Feb 24, 2009Micron Technology, Inc.Memory utilizing oxide-nitride nanolaminatesUS7494927Mar 20, 2003Feb 24, 2009Asm Internatio
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