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  • 20130199824MICROELECTRONICS DEVICE INCLUDING ANISOTROPIC CONDUCTIVE LAYER AND METHOD OF FORMING THE SAME - A microelectronics device includes a first substrate, first electrodes disposed on the first substrate, an insulating layer covering the first electrodes, the insulating layer including openings on the first electrodes, and an anisotropic conductive film on the insulating layer, the anisotrop
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