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  • method for forming a film including metal, nitrogen and carbonUS7494937 *Mar 30, 2007Feb 24, 2009Tokyo Electron LimitedStrained metal silicon nitride films and method of formingUS7531452 *Mar 30, 2007May 12, 2009Tokyo Electron LimitedStrained metal silicon nitride films and method of formingUS7576005 *Oct 2, 2007Aug 18, 2009Infineon Technologies AgDense seed layer and method of formationUS7666479
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