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An Entity of Type : prov:Entity, within Data Space : webisa.webdatacommons.org associated with source dataset(s)

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  • The photoresist composition containing a polymer having silicon atoms and sulfonium salt units as defined in claim 2, wherein said R4 is a radical selected from the group consisting of linear and branched C2 -C8 alkylene groups and a C5 -C8 cycloalkylene group.
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