At first, the various actual examples of the structure in each of which the light shield film is formed at the lower side of the TFT in the electro-optical apparatus of this embodiment are described with reference to FIG. 18( a) to FIG. 18( c), FIG. 19( a) to FIG. 19( c), FIG. 20( a) to FIG. 20( b) and FIG. 21( a) to FIG. 21( b).