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  • cting a solution including imprinting materials and a polymeric fluorinated surfactant;US20050187339 *23 Feb 200425 Aug 2005Molecular Imprints, Inc.Materials for imprint lithographyUS20050192421 *27 Feb 20041 Sep 2005Molecular Imprints, Inc.May be used as an etch mask for a patterned imprinted layer comprising protrusions and recessionsUS20050236739 *22 Feb 200527 Oct 2005Board Of Regents, The Uni
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