About: http://webisa.webdatacommons.org/101680939

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	However, the etching solution includes an excessive amount of sulfuric acid so that an etching rate is not easily controlled, and a substrate such as a silicon wafer may be damaged.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com