| http://www.w3.org/ns/prov#value | - As shown in FIG. 1, the plasma substrate processing apparatus 100 has a plasma processing chamber 101 in a cylindrical shape as a whole, with a sidewall 101 a and a bottom portion 101 b thereof, for example, being made of conductors such as aluminum, and an inner part of the plasma processing chamber 101 is formed as an airtight processing space S. The plasma processing chamber 101 may be formed i
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