About: http://webisa.webdatacommons.org/102414459

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Plasma etching can then remove both the photoresist and the underlying polymer in such a manner as to produce a hollow frame-like structure in the underlying polymer with angled side walls.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com