About: http://webisa.webdatacommons.org/103571515

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	In each of the process chambers PC1, PC2, . . . , PC6, a process such as etching or film forming is performed on a substrate such as a semiconductor wafer.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com