| http://www.w3.org/ns/prov#value | - overing the second layer other than the main surface with a photo-resist by a gas phase film forming method or the deposited film by a lift-off method of removing the photo-resist thereby forming the counter electrode and/or the reference electrode and, further, covering the entire surface with a photo-resist and removing a portion of the photo-resist on the main surface of the counter electrode a
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