| http://www.w3.org/ns/prov#value | - However, the etchant used is not limited to HF and other etchants such as a CHF3 or other fluorine based plasma etchants may also be used. [0043] Prior to forming the well 31, it may be desirable to planarize the dielectric layer 23 so that the dielectric layer 23 has a substantially planar interface surface 27 upon which a platform substrate (not shown) will be mounted as will be discussed below.
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