| http://www.w3.org/ns/prov#value | - otoresist is removed; the step of a second exposure for exposing a region of the second photoresist which correspond other regions except regions sandwiched between the pair of lines of the aperture pattern for light transmission; the step of patterning by developing the exposed second photoresist; and the step of processing the first film to be processed under the second photoresist using the pat
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