| http://www.w3.org/ns/prov#value | - More specifically, ions including phosphorus ions are implanted into source and drain regions and LDD regions by known ion doping (also called plasma doping), and then thermal annealing or optical annealing (or both) is performed to improve the crystallinity of the silicon film and activate impurities. [0074] The same steps as in the first embodiment are employed until formation of a crystalline s
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