| http://www.w3.org/ns/prov#value | - More specifically, ions including phosphorus ions are implanted into LDD regions by known ion doping (also called plasma doping), then P-type impurity ions are implanted into source and drain regions and the LDD regions, and finally thermal annealing or optical annealing (or both) is performed to improve the crystallinity of the silicon film and activate impurities. [0079] Manufacturing steps of t
|
