| http://www.w3.org/ns/prov#value | - For example, a dielectric mask including a dielectric film of SiNx or SiO2 or of a metallic film of Ti or the like, or a metallic mask layer is deposited on the lower cladding layer 12, the active layer 11, and the upper cladding layer 13 sequentially formed on the substrate 17 shown in FIG. 2A. On the dielectric mask or metallic mask layer, a pattern for forming the refractive index profile struc
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