| http://www.w3.org/ns/prov#value | - Note that, when a radical produced by decomposing a reactive gas such as NF3 or CF4 is introduced into the film formation chamber (A) 703, the interior of the film formation chamber (A) 703 can be cleaned. [0137] In this embodiment, a film formation chamber having the structure shown in FIG. 2A is provided as the film formation chamber (A) 703, in which a first organic compound film indicating lig
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