| http://www.w3.org/ns/prov#value | - More specifically, the invention relates to a pattern inspection apparatus for inspecting a pattern configuration or a defect or an error in a pattern configuration of an inspection sample, such as a mask to be used for X-ray exposure technology for transferring a fine circuit pattern or the like onto a semiconductor substrate employing an X-ray beam including a synchrotron radiation beam (SOR), a
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