| http://www.w3.org/ns/prov#value | - Moreover, with reference to FIG. 1, the repeated thermal oxidation of silicon field emitters is somewhat undesirable from the standpoint that the typically high temperatures that are utilized in such oxidation processes may create crystalline defects, which are indicated by arrows, in the silicon field emitter, such as point, line (e.g., slip, straight dislocations, dislocation loops, etc.), area,
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