| http://www.w3.org/ns/prov#value | - or material which will be subsequently formed within holes 3 and 4 and prevent deposition on other areas of the substrate, if the substrate is a semiconductor material, a layer 5 of an insulating material such as silicon oxide, for example, is formed over the entire surface of the substrate 10, including the inner walls of the holes 3 and 4, as shown in FIG. 10, the substrate illustrated in FIG. 1
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