| http://www.w3.org/ns/prov#value | - To attain the above object, a first aspect of the present invention is a method for forming a film of a processing solution on a substrate, comprising the steps of rotating the substrate, supplying the processing solution discharged from a nozzle onto the rotating substrate, moving a position on the substrate of the processing solution to be supplied from the nozzle nearly in a radial direction of
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