PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • Modification and Usage While the film forming apparatus and method incorporating the principles of this invention are adaptable for use in the manufacture of semiconductor integrated circuit (IC) devices including logic circuits and memory chips such as dynamic random access memories (DRAMs), the invention are also applicable to the fabrication of other types of microelectronics devices including,
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