| http://www.w3.org/ns/prov#value | - For example, the CVD apparatus and CVD method of this invention are applicable to a CVD method for forming various kinds of insulating film such as; a CVD method for forming an Al thin film using a liquid organic aluminum compound such as triisobutyl aluminum; a CVD method for forming a Ti thin film or TiN thin film using an organic titanium compound such as tetradimethylamide titanium; a CVD meth
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