| http://www.w3.org/ns/prov#value | - on epitaxial films, and films containing silicon nitride (Si3N4), siliconoxynitride (SiOxNy) and/or silicon...http://www.google.com/patents/US7531679?utm_source=gb-gplus-sharePatent US7531679 - Composition and method for low temperature deposition of silicon-containing films such as films including silicon nitride, silicon dioxide and/or silicon-oxynitrideAdvanced Patent SearchPublication numberUS
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