About: http://webisa.webdatacommons.org/108838777

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	FIG. 1 depicts a conventional electrostatic chuck adapted to support and electrostatically hold a workpiece to be processed, such as a semiconductor wafer, on a pedestal within a high density plasma reaction chamber.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com