| http://www.w3.org/ns/prov#value | - In addition, although the separation layer 102 is formed in contact with the substrate 100, an insulating layer such as a silicon oxide film, a silicon oxynitride film, a silicon nitride film, or a silicon nitride oxide film may be formed in contact with the substrate 100 as needed, and the separation layer 102 may be formed in contact with the insulating layer.
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