PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • In addition, after formation of the oxide semiconductor films such as the semiconductor layer 103 and the source and drain regions 104 a and 104 b, heating treatment is preferably performed thereon.
http://www.w3.org/ns/prov#wasQuotedFrom
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