| http://www.w3.org/ns/prov#value | - In this method, on a surface of a silicon substrate, preferably on a polished [111] surface of an Si monocrystal, a layer of calcium metal is vapour deposited with a desired thickness, for example 100 to 500 nm, and alloyed in by heating to about 800??? C. This layer is then converted wet chemically to siloxene in the manner described above by the action of HCl.
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