| http://www.w3.org/ns/prov#value | - Further, many materials such as Si, poly-Si, Si3 N4 and Al can be processed by altering reaction gases such as CF4, CF4 +O2, CF4 +H2, C3 H8, CCl4 and BCl3 according to known dry etching techniques through the mask of the obtained multi-layer resist.
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