| http://www.w3.org/ns/prov#value | - Especially by utilizing silicon as semiconductor and by irradiating laser light or other light as strong as laser light to non-single crystal silicon film, a silicon nitride film, a silicon oxide film, or a silicon oxinitride film with good interface state is formed on the surface of a non-single crystal semiconductor film, and crystal character of the non-single crystal semiconductor film can be
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