PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • 20100244260SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME - A semiconductor device includes: a first insulting film formed on a semiconductor substrate; a contact including a conductive film buried in the first insulating film to reach the semiconductor substrate; and a first barrier layer including a high melting point metal, formed between the semiconductor substrate and the conductive
http://www.w3.org/ns/prov#wasQuotedFrom
  • faqs.org