About: http://webisa.webdatacommons.org/117543124

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	When the etch amount of the etch target is changed by varying the bias power during the etching process, especially for forming the tungsten-based sacrificial hard mask 12, a CD and size of the ArF photoresist pattern decrease.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com