About: http://webisa.webdatacommons.org/119021050

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The improved buried metal plug structure of this invention is formed next by depositing a first insulating layer, such as silicon oxide, on the FET devices and elsewhere on the substrate.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com