About: http://webisa.webdatacommons.org/119687048

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	Moreover, the etching speed of the mask material, such as SiO2, is adequately slow.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com