| http://www.w3.org/ns/prov#value | - As shown in FIG. 20C on its left-hand side, the turntable 1 has concentric circular patterns of projecting regions on its upper surface which form respective projecting regions 4a on the upper surface of the abrasive cloth 4 at such positions as to pass through the center and other intermediate portions of the semiconductor wafer 2.
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