PropertyValue
http://www.w3.org/1999/02/22-rdf-syntax-ns#type
http://www.w3.org/ns/prov#value
  • Further, the photomask is not particularly limited, and any mask may be used as long as it can be brought into close contact with the photosensitive glass substrate 2 and allows selective exposure of the through-hole formation part.
http://www.w3.org/ns/prov#wasQuotedFrom
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