About: http://webisa.webdatacommons.org/124590765

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	During fabrication, the semiconductor devices are typically subjected to numerous processes using plasma, for example, plasma etching or reactive ion etch (RIE), thin film deposition, ashing, and/or other processes including plasma.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com