| http://www.w3.org/ns/prov#value | - Also preferably, the step of doping impurity may be a step including a step (1) of forming a protective layer on the underlay so as to cover the stacked layer structure and gate electrode and levelling the upper surface of this protective layer, and a step (2) of ion implantation of impurity from the upper surface of the protective layer towards the underlay.
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