About: http://webisa.webdatacommons.org/132024113

Property	Value
http://www.w3.org/1999/02/22-rdf-syntax-ns#type	http://www.w3.org/ns/prov#Entity
http://www.w3.org/ns/prov#value	The above description and correlating figures, i.e. FIGS. 2(a)-(e), show the process that is employed in the present invention in forming a high aspect hole having vertical sidewalls in a surface of a semiconductor structure.
http://www.w3.org/ns/prov#wasQuotedFrom	google.com