| http://www.w3.org/ns/prov#value | - However, the first substrate 500 may be covered with an insulating film containing such as silicon oxide, silicon nitride, silicon nitride-oxide and then, the metal film 501 may be formed thereover. [0078] After the metal film 501 is formed, an oxide film 502 to serve as an insulating film is formed to be laminated without being exposed to air.
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